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A User's Guide to Ellipsometry

Tompkins, Harland G.
ISBN-10: 0126939500
ISBN-13: 9780126939507

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1 used from $108.50
Text for graduate students explains how to determine material properties and parameters for inaccessible substrates and unknown films as well as how to measure extremely thin films. 1993 edition.This book is specifically designed for the user who wishes expanded use of ellipsometry beyond the relatively limited number of turn-key applications.
The book provides a concise discussion of theory and instrumentation before describing how to use optical parameters to determine material properties and optical parameters for inaccessible substrates and unknown films, and how to measure extremely thin films. The book also addresses polysilicon, a material commonly used in the microelectronics industry, and the effect of substrate roughness. This book's concepts and applications are reinforced through the 14 case studies that illustrate specific applications of ellipsometry from the semiconductor industry as well as studies involving corrosion and oxide growth. BRKey FeaturesBR* Allows the user to optimize turn-key operation of ellipsometers and move beyond limited turn-key applicationsBR* Provides comprehensive discussion of the measurement of film thickness and optical constants in filmBR* Discusses the trajectories of the ellipsometric parameters Del and Psi and how changes in the materials affect the parametersBR* Includes 14 case studies to reinforce specific applicationsBR* Includes three appendices for helpful references
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Preface
Theoretical Aspects
Instrumentation
Using Optical Parameters to Determine Material Properties
Determining Optical Parameters for Inaccessible Substrates and Unknown Films
Extremely Thin Films
The Special Case of Polysilicon
The Effect of Roughness
Case Studies
Dissolution and Swelling of Thin Polymer Films
Ion Beam Interaction with Silicon
Dry Oxidation of Metals
Optical Properties of Sputtered Chromium Suboxide Thin Films
Ion-Assisted Film Growth of Zirconium Dioxide
Electrochemical/Ellipsometric Studies of Oxides on Metals
Amorphous Hydrogenated Carbon Films
Fluoropolymer Films on Silicon from Reactive Ion Etching
Various Films on InP
Benzotriazole and Benzimidazole on Copper
Gas Adsorption on Metal Surfaces
Silicon-Germanium Thin Films
Profiling of HgCdTe
Oxides and Nitrides of Silicon
Appendices
Appendix A: Del/Psi Trajectory Calculations
Appendix B: Effective Medium Considerations
Appendix C: Literature Values of Optical Constants of Various Materials
Index


List price: $84.95
Edition: 1993
Publisher: Elsevier Science & Technology Books
Binding: Trade Cloth
Pages: 260
Size: 6.00" wide x 9.00" long x 0.70" tall
Weight: 1.23 lbs.
Language: English

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